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ALS Beamlines and Contacts

Indvidual Beamline Parameters and Beamline Scientist Contact Information

beamclock Clickable ALS Beamline Diagram
Beamline data is available through the links below. Unless otherwise noted, all beamlines are currently operational.
Beamline Source* Areas of Research/Techniques
(linked to beamline Web site, where available)
Energy Range Beamline Scientist(s)
1.4.3 Bend Infrared spectromicroscopy 0.05-1.2 eV M. Martin
(510) 495-2231
1.4.4 Bend Infrared spectromicroscopy 0.05-1.5 eV
2.1 Bend National Center for X-Ray Tomography (NCXT)
Operational 2008
200 eV-7 keV M. Le Gros
(510) 486-6892
3.1 Bend Diagnostic beamline 1-2 keV F. Sannibale
(510) 486-5924
3.2.1 Bend Commercial deep-etch x-ray lithography (LIGA) 3-12 keV G. Reiff
(510) 495-2032
4.0.2 EPU5 Magnetic and biochemical spectroscopy 80-1900 eV E. Arenholz
(510) 495-2041
4.0.3 EPU9 High-resolution spectroscopy of complex materials (MERLIN)
Operational: 2008

10-150 eV Yi-De Chuang
(510) 495-2041
4.2.2 Superbend Multiple-wavelength anomalous diffraction (MAD) and monochromatic protein crystallography 5-17 keV E. Westbrook
(510) 486-6652
5.0.1 W11 Monochromatic macromolecular crystallography and Se Single Wavelength Anomalous Diffraction (Se-SAD) 12.4 keV S. Morton
P. Zwart
(510) 495-2051
(510) 495-2052
(510) 495-2054
5.0.2 W11 Multiple-wavelength anomalous diffraction (MAD) and monochromatic macromolecular crystallography 4-16 keV
5.0.3 W11 Monochromatic macromolecular crystallography 12.4 keV
5.3.1 Bend Instrumentation development 1.8-12 keV R. Celestre
(510) 495-2053
5.3.2 Bend Polymer scanning transmission x-ray microscopy 200-650 eV D. Kilcoyne
(510) 495-2057
6.0.1 U3 Femtosecond phenomena
Operational: 2008
2-10 keV P. Heimann
(510) 495-2087
6.0.2 U3 Femtosecond phenomena 200-1800 eV
6.1.2 Bend High-resolution zone-plate microscopy 300-1300 eV P. Fischer
(510) 495-2061
6.3.1 Bend Magnetic spectroscopy and materials science 300-2000 eV E. Arenholz
510 495-2062  
6.3.2 Bend Calibration and standards; EUV optics testing; atomic, molecular, and materials science 50-1300 eV E. Gullikson
(510) 495-2063
7.0.1 U5 Surface and materials science, spectromicroscopy 60-1200 eV J. Guo
(510) 495-2070
(510) 495-2079
E. Rotenberg
(510) 495-2071
Aaron Bostwick
(510) 486-4816
7.2 Bend Diagnostic beamline Far IR- 17 keV F. Sannibale
(510) 486-5924
7.3.1 Bend Magnetic microscopy, spectromicroscopy 175-1500 eV A. Scholl
(510) 495-2073
7.3.3 Bend Small- and wide-angle x-ray scattering (SAXS/WAXS) 10 keV A. Hexemer
(510) 495-2075
(510) 495-2076
8.0.1 U5 Surface and materials science, imaging photoelectron spectroscopy, soft x-ray fluorescence 65-1400 eV J. Denlinger
W. Yang
(510) 495-2080
(510) 495-2089
8.2.1 Superbend Multiple-wavelength anomalous diffraction (MAD) and monochromatic macromolecular crystallography 5-17 keV C. Ralston
S. Morton
(510) 495-2081
(510) 495-2082
8.2.2 Superbend Multiple-wavelength anomalous diffraction (MAD) and monochromatic macromolecular crystallography 5-17 keV
8.3.1 Superbend Multiple-wavelength anomalous diffraction (MAD) and monochromatic protein crystallography 2.4-18 keV J. Holton
(510) 495-2083
8.3.2 Superbend Tomography 5-60 keV A. MacDowell
(510) 495-2005
9.0.1 U10 Coherent optics experiments 200-800 eV S. Marchesini
D. Shapiro
(510) 495-2091
9.0.2 U10 Chemical dynamics 5-30 eV M. Ahmed
K. Wilson
(510) 495-2092
9.3.1 Bend Atomic, molecular, and materials science 2.2-5.5 keV Z. Hussain
(510) 486-7591
9.3.2 Bend Chemical and materials science, circular dichroism, spin resolution 30-1400 eV Z. Liu
(510) 495-2109
10.0.1 U10 Photoemission of highly correlated materials; high-resolution atomic, molecular, and optical physics 17-340 eV (HERS)
Z. Hussain
(510) 486-7591

(AMO)
A. Aguilar
(510) 495-2102
10.3.1 Bend X-ray fluorescence microprobe 3-20 keV S. Cliff
(510) 495-2103
10.3.2 Bend Environmental and materials science, micro x-ray absorption spectroscopy 2.5-17 keV M. Marcus
(510) 495-2106
11.0.1 EPU 5 Magnetic microscopy, spectromicroscopy (PEEM3)

100-2000 eV A. Scholl
(510) 495-2010
11.0.2 EPU5 Molecular environmental science 95-2000 eV D. Shuh
T. Tyliszczak
(510) 495-2077
11.3.1 Bend Small-molecule crystallography 6-17 keV S. Teat
(510) 495-2117
11.3.2 Bend Inspection of EUV lithography masks 50-1000 eV K. Goldberg
(510) 495-2077
Iacopo Mochi
12.0.1 U8 EUV optics testing and interferometry, angle- and spin-resolved photoemission 24-350 eV (ARPES)
A. Fedorov
(510) 495-2121

(EUV/ MET)
K. Goldberg
P. Naulleau
(510) 495-2120
(510) 495-2107
12.0.2 U8 Coherent soft x-ray science 200­1000 eV S. Roy
(510) 495-2107
12.2.2 Superbend California High-Pressure Science Observatory (CALIPSO) 6-40 keV S. Clark
(510) 495-2055
12.3.1 Superbend Structurally Integrated Biology for Life Sciences (SIBYLS) 5.5-17 keV G. Hura
M. Hammel
S. Classen
(510) 495-2134
12.3.2 Superbend X-ray microdiffraction
6-22 keV N. Tamura
(510) 486-4625
BTF Linac Beam Test Facility 50-MeV electrons B. Ludewight
(510) 495-2021
W. Byrne
(510) 495-2009
* Bend      bend magnet
  Superbend Superconducting bend magnet
  EPUx      x-cm-period elliptical polarization undulator
  Ux        x-cm-period undulator
  Wx        x-cm-period wiggler

Technical Specifications