Operational

2001

Source characteristics

Bend magnet

Energy range

3-12 keV

Monochromator

None

Endstations

Small hutch with wafer scanner

Calculated spot size at sample

100 x 10 mm

Samples

Format

Wafers with resist coating

Sample environment

Ambient, air

Scientific applications

Deep-etch x-ray lithography (LIGA)

Local contact

Name: Cheryl Hauck
Phone: (510) 486-7885
Fax: (510) 486-4102
Email: cahauck@lbl.gov

Spokesperson

Name: Dale Boehme
Affiliation: AXSUN Technologies Inc.
Phone: (925) 373-3174, ext. 102
Fax: (925) 373-3178
Email: dboehme@axsun.com