Beamline 7.0.1
Surface and Materials Science, Spectromicroscopy,
Spin Resolution, Photon-Polarization Dichroism
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Operational |
Now |
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Source characteristics |
5-cm-period undulator (U5) |
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Energy range |
See endstation tables |
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Monochromator |
See endstation tables |
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Endstations |
Scanning photoemission microscope (SPEM) |
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Endstation |
Scanning photoemission microscope (SPEM) |
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Characteristics |
Designed for submicron XPS |
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Energy range |
100-800 eV |
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Monochromator |
SGM (gratings: 150, 380, 925 lines/mm) |
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Calculated flux (1.9 GeV, 400 mA) |
108-109 photons/s/0.01%BW |
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Resolving power (E/DE) |
3000 |
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Spatial resolution |
Scanning microscope with focusing by means of Fresnel zone plates; resolution determined by spot size, which is 150 nm with current zone plates but will improve with new zone plates |
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Detectors |
Hemispherical electron energy analyzer; total electron yield detector |
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Spot size at sample |
150 nm with current zone plates |
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Samples |
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Format |
UHV-compatible solids up to 25 mm in diameter |
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Preparation |
Preparation chamber with sputtering and annealing provided |
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Sample environment |
UHV |
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Special notes |
Optical alignment equipment provided so that visible marks on the sample surface can be used to find an area of interest prior to x-ray measurements; in-situ heating and cooling |
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Experimental techniques |
XPS, NEXAFS, imaging of areas up to 100 µm across |
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Local contact |
Name: Tony Warwick |
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Spokesperson |
Name: James Tobin |
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Endstation |
Scanning transmission x-ray microscope (STXM) |
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Characteristics |
Used to make x-ray images and NEXAFS spectra of thin samples in transmission |
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Energy range |
180-900 eV |
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Monochromator |
SGM (gratings: 150, 380, 925 lines/mm) |
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Calculated flux (1.9 GeV, 400 mA) |
~107 photons/s/0.01%BW |
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Resolving power (E/DE) |
3000 (typical), 5000 (optimized) |
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Spatial resolution |
Scanning microscope with focusing by means of Fresnel zone plates; resolution determined by spot size, which is 100 nm with current zone plates but will improve with new zone plates |
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Detectors |
Photon-counting detector behind the sample records the intensity of the transmitted radiation, generating an image pixel by pixel during the rastering |
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Spot size at sample |
100 nm with current zone plates |
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Samples |
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Format |
Thin sections or films (100 nm thick), 3 x 3 mm in area |
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Preparation |
No preparation chamber available |
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Sample environment |
Helium at 1 atm |
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Special notes |
Samples may be wet or dirty; thin films may be deposited on silicon nitride windows; optical alignment is provided by looking at the back side of the sample to locate regions of interest from optical micrographs |
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Experimental techniques |
Imaging, NEXAFS in small spots |
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Local contact |
Name: Tony Warwick |
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Spokesperson |
Name: James Tobin |
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Endstation |
Spin-resolved endstation (SPIN) |
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Characteristics |
Spin- and angle-resolved XPS spectroscopy; x-ray linear dichroism measurement |
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Energy range |
60-1200 eV |
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Monochromator |
SGM (gratings: 150, 380, 925 lines/mm) |
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Calculated flux (1.9 GeV, 400 mA) |
~1012 photons/s/0.01%BW (resolution dependent) |
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Resolving power (E/DE) |
Less than or equal to 8000 |
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Spatial resolution |
100 µm-4 mm |
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Detectors |
Hemispherical electron energy analyzer with Mini-Mott detector |
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Spot size at sample |
~200 µm |
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Samples |
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Format |
UHV-compatible solids up to 12 mm in diameter |
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Preparation |
In-situ sputtering, sample heating and cooling (LN2) available |
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Sample environment |
UHV; sample-transfer system allows introduction of samples without venting chamber |
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Experimental techniques |
XPS, spin-resolved XPS, XMLDAD |
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Local contact |
Name: Michael Hochstrasser |
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Spokesperson |
Name: James Tobin |
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Endstation |
UltraESCA |
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Characteristics |
High-resolution, angle-resolved XPS spectroscopy; capable of making images by rastering the sample through a fixed spot; sample is rotated for angle-resolved measurements |
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Energy range |
60-1200 eV |
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Monochromator |
SGM (gratings: 150, 380, 925 lines/mm) |
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Calculated flux (1.9 GeV, 400 mA) |
~1012 photons/s/0.01%BW (resolution dependent) |
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Resolving power (E/DE) |
Less than or equal to 8000 |
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Spatial resolution |
100 µm 4 mm |
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Detectors |
Hemispherical electron energy analyzer; total electron yield detector |
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Spot size at sample |
50 µm |
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Samples |
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Format |
UHV-compatible solids up to 25 mm in diameter |
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Preparation |
Preparation chamber with sputtering is provided |
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Sample environment |
UHV |
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Special notes |
LEED and in-situ sample heating and cooling available |
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Scientific applications |
Condensed matter science, surface science |
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Experimental techniques |
XPS, XPD, NEXAFS |
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Local contact |
Name: Eli Rotenberg |
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Spokesperson |
Name: James Tobin |
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Endstation |
Fluorescence spectrometer |
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Characteristics |
Grating spectrometer for high-resolution (1:3000) |
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Energy range |
50-1200 eV |
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Monochromator |
SGM (gratings: 150, 380, 925 lines/mm) |
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Calculated flux (1.9 GeV, 400 mA) |
3 x 1012 photons/s/0.01%BW (at 800 eV) |
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Resolving power (E/DE) |
1800 (at 800 eV) |
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Detectors |
Channel-plate photon counter in spectrometer focal plane |
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Spot size at sample |
50 µm |
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Samples |
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Format |
Solids or gases in windowed cell |
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Preparation |
No preparation chamber provided |
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Sample environment |
UHV |
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Special notes |
This spectrometer is installed by the group from the University of Uppsala, Sweden. Potential users are asked to contact Professor Nordgren to explore possible collaborations. |
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Experimental techniques |
Photon-in/photon-out spectroscopy |
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Local contact |
Name: Tony Warwick |
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Spokesperson |
Name: Joseph Nordgren |
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