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Beamline 7.3.1.2Surface and Materials Science,
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Operational |
Now |
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Source characteristics |
Bend magnet |
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Energy range |
175-1500 eV |
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Monochromator |
SGM |
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Calculated flux (1.9 GeV, 400 mA) |
1 x 1010 photons/s/0.01%BW at 800 eV |
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Resolving power (E/DE) |
1800 at 800 eV |
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Endstations |
MicroXPS |
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Characteristics |
X-ray photoelectron spectroscopy study of |
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Spatial resolution |
1 x 1 µm |
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Detectors |
Electron energy analyzer |
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Spot size at sample |
1 x 1 µm |
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Samples |
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Format |
UHV-compatible solids up to 50 x 50 mm |
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Preparation |
Heating, sputtering |
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Sample environment |
UHV |
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Special notes |
In-vacuum fiducialization of sample using optical visible-light microscope; high-precision x-y stage; laser interferometer encoding |
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Scientific applications |
Study of microstructures and interfaces in integrated circuits |
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Experimental techniques |
MicroXPS, NEXAFS, MCD |
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Local contact |
Name: Glenn Ackerman |
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Spokesperson |
Name: Harry Fujimoto |
Table of all beamlines