Operational

Now

Source characteristics

Bend magnet

Energy range

30-1400 eV

Monochromator

SGM (gratings: 100, 600, 1200 lines/mm)

Calculated flux (1.9 GeV, 400 mA)

~10¹¹ photons/s/0.1%BW at 400 eV

Resolving power (E/DE)

3000 typical, 8000 max (with 10-µm slits)
Capability for circularly polarized radiation

Endstation

Advanced materials chamber (AMC)

Characteristics

PHI analyzer, sample preparation with LEED, XPS, evaporation, sputtering, precision manipulator

Spatial resolution

0.5 x 1 mm

Detectors

16-element multichannel detector, partial electron yield detector

Spot size at sample

0.5 x 1 mm

Samples

Format

UHV-compatible solids up to 10 mm in diameter

Preparation

LEED, sputtering, evaporation, quartz-crystal oscillator, XPS, large-gap in-situ magnet; heating up to 2300 K; cooling down to 200 K

Sample environment

UHV

Special notes

Sample transfer capability

Scientific applications

Studies of atomic and electronic structure of surfaces

Experimental techniques

Photoelectron diffraction, XPS, NEXAFS, MCD

Local contact/spokesperson

Name: Nasser Hamdan
Affiliation: Advanced Light Source, Berkeley Lab
Phone: (510) 486-7633
Email: NMHamdan@lbl.gov