Operational

Now

Source characteristics

8-cm-period undulator (U8)

Endstation

EUV interferometer (2 available)

Energy range

60-320 eV

Monochromator

VLS-PGM

Calculated flux (1.9 GeV, 400 mA)

~ 5 x 10¹³ photons/s/1%BW at 134 eV

Resolving power (E/DE)

200-1000

Detectors

GaAsP flux monitor, silicon 1024 x 1024 CCD array

Samples

Format

All-reflective, multilayer-coated EUV optics

Sample environment

10^-7 or 10^-4 torr O₂

Scientific applications

Interferometric wavefront measurement of optics designed for EUV lithography

Local contacts

Name: Kenneth Goldberg
Phone: (510) 495-2261
Fax: (510) 486-4550
Email: kagoldberg@lbl.gov

Name: Patrick Naulleau
Phone: (510) 486-4529
Fax: (510) 486-4550
Email: pnaulleau@lbl.gov

Spokespersons

Name: Jeffrey Bokor
Affiliation: Univ. of California, Berkeley;
Center for X-Ray Optics, Berkeley Lab
Phone: (510) 642-4134
Fax: (510) 642-2739
Email: jbokor@eecs.berkeley.edu

Name: David Attwood
Affiliation: Center for X-Ray Optics, Berkeley Lab
Phone: (510) 486-4463
Fax: (510) 486-495
Email: dtattwood@lbl.gov