|
Beamline
|
Source*
|
Areas of Research/Techniques
|
Energy Range
|
Available
|
|
1.4.1
|
Bend
|
Ultraviolet photoluminescence
|
1.6-6.2 eV
|
Now
|
|
1.4.2
|
Bend
|
Visible and infrared Fourier transform spectroscopy (FTIR)
|
0.002-3 eV
|
Now
|
|
1.4.3
|
Bend
|
Infrared spectromicroscopy
|
0.05-1 eV
|
Now
|
|
3.1
|
Bend
|
Diagnostic beamline
|
200-280 eV
|
Now
|
|
3.3.1
|
Bend
|
Commercial deep-etch x-ray lithography (LIGA)
|
3-12 keV
|
2001
|
|
3.3.2
|
Bend
|
Deep-etch x-ray lithography (LIGA)
|
1-20 keV
|
Now
|
|
4.0.1-2
|
EPU5
|
Magnetic spectroscopy
|
60-1800 eV
|
Now
|
|
4.2.2
|
Superbend
|
Multiple-wavelength anomalous diffraction (MAD) and monochromatic protein crystallography
|
6-18 keV
|
2002
|
|
5.0.1
|
W16
|
Monochromatic protein crystallography
|
12.4 keV
|
2001
|
|
5.0.2
|
W16
|
Multiple-wavelength anomalous diffraction (MAD) and monochromatic protein crystallography
|
3.5-14 keV
|
Now
|
|
5.0.3
|
W16
|
Monochromatic protein crystallography
|
12.4 keV
|
Now
|
|
5.3.1
|
Bend
|
Femtosecond phenomena
|
0.1-12 keV
|
Now
|
|
5.3.2
|
Bend
|
Polymer scanning transmission x-ray microscopy
|
150-650 eV
|
2001
|
|
6.1.2
|
Bend
|
High-resolution zone-plate microscopy
|
300-900 eV
|
Now
|
|
6.3.1
|
Bend
|
Calibration and standards, EUV/soft x-ray optics testing, solid-state chemistry
|
500-2000 eV
|
Now
|
|
6.3.2
|
Bend
|
Calibration and standards; EUV optics testing; atomic, molecular, and materials science
|
50-1300 eV
|
Now
|
|
7.0.1
|
U5
|
Surface and materials science, spectromicroscopy, spin resolution, photon-polarization dichroism
|
50-1200 eV
|
Now
|
|
7.3.1.1
|
Bend
|
Magnetic microscopy, spectromicroscopy
|
175-1500 eV
|
Now
|
|
7.3.1.2
|
Bend
|
Surface and materials science, micro x-ray photoelectron spectroscopy
|
175-1500 eV
|
Now
|
|
7.3.3
|
Bend
|
X-ray microdiffraction, hard x-ray technique development
|
6-12 keV
|
Now
|
|
8.0.1
|
U5
|
Surface and materials science, imaging photoelectron spectroscopy, soft x-ray fluorescence
|
65-1400 eV
|
Now
|
|
8.2.1
|
Superbend
|
Multiple-wavelength anomalous diffraction (MAD) and monochromatic protein crystallography
|
6-18 keV
|
2001
|
|
8.2.2
|
Superbend
|
Multiple-wavelength anomalous diffraction (MAD) and monochromatic protein crystallography
|
6-18 keV
|
2001
|
|
8.3.1
|
Superbend
|
Multiple-wavelength anomalous diffraction (MAD) and monochromatic protein crystallography
|
2.4-15 keV
|
2001
|
|
8.3.2
|
Superbend
|
Tomography
|
3-45 keV
|
2001
|
|
9.0.1
|
U10
|
Coherent optics experiments
|
200-800 eV
|
Now
|
|
9.0.2
|
U10
|
Chemical reaction dynamics, photochemistry, high-resolution photoelectron and photoionization spectroscopy, photoelectron and photoionization imaging and spectroscopy
|
5-30 eV
|
Now
|
|
9.3.1
|
Bend
|
Atomic, molecular, and materials science
|
2.2-6 keV
|
Now
|
|
9.3.2
|
Bend
|
Chemical and materials science, circular dichroism, spin resolution
|
30-1400 eV
|
Now
|
|
10.0.1
|
U10
|
Photoemission of highly correlated materials; high-resolution atomic, molecular, and optical physics
|
17-340 eV
|
Now
|
|
10.3.1
|
Bend
|
X-ray fluorescence microprobe
|
3-20 keV
|
Now
|
|
10.3.2
|
Bend
|
Environmental and materials science, micro x-ray absorption spectroscopy
|
3-17 keV
|
2001**
|
|
11.0.2
|
EPU5
|
Molecular environmental science
|
75-2000 eV
|
2002
|
|
11.3.2
|
Bend
|
Inspection of EUV lithography masks
|
50-1000 eV
|
Now
|
|
12.0.1
|
U8
|
EUV optics testing, interferometry, coherent optics
|
60-320 eV
|
Now
|
|
12.3.1
|
Superbend
|
Multiple-wavelength anomalous diffraction (MAD) protein crystallography and small-angle x-ray scattering (SAXS)
|
6-18 keV
|
2002
|
|
BTF
|
Linac
|
Beam Test Facility
|
50-MeV electrons
|
Now
|
** Beamline 10.3.2 is being upgraded to provide microXAS capability for environmental and materials science.