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Beamline 12.0.1
EUV Optics Testing and Interferometry,
Angle- and Spin-Resolved Photoemission
EUV interferometer (2 available)
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Operational
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Now
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Energy range
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60–320 eV
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Monochromator
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VLS-PGM
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Calculated flux (1.9 GeV, 400 mA)
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~ 5 x 1013 photons/s/1%BW at 134 eV
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Resolving power (E/DE)
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200–10,000
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Detectors
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GaAsP flux monitor, silicon 1024 x 1024 CCD array
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Samples
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Preparation
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All-reflective, multilayer-coated EUV optics
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Sample environment
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10-7 or 10-4 Torr O2
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Special notes
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Interferometer stations also support different modes of high-resolution EUV pattern transfer capabilities
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Scientific applications
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Interferometric wavefront measurement of optics designed for EUV lithography
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Local contacts
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Name: Kenneth Goldberg
Phone: (510) 495-2261
Fax: (510) 486-4550
Email: kagoldberg@lbl.gov
Name: Patrick Naulleau
Phone: (510) 486-4529
Fax: (510) 486-4550
Email: pnaulleau@lbl.gov
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Spokespersons
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Name: Jeffrey Bokor
Affiliation: Univ. of California, Berkeley;
Center for X-Ray Optics, Berkeley Lab
Phone: (510) 642-4134
Fax: (510) 642-2739
Email: jbokor@eecs.berkeley.edu
Name: David Attwood
Affiliation: EUV/LLC
Phone: (510) 486-4463
Fax: (510) 486-4966
Email: attwood@eecs.berkeley.edu
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Angle- and Spin-Resolved Photoemission
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Operational
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2002
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Energy range
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20–320 eV
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Monochromator
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VLS-PGM, with two gratings (200 and 1200 lines/mm)
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Calculated flux (1.9 GeV, 400 mA)
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~ 5 x 1013 photons/s/1%BW at 134 eV
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Resolving power (E/DE)
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200–10,000
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Detectors
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Scienta SES 100 (angle-resolved photoemission) and Scienta SES 200 (spin-resolved photoemission)
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Samples
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Format
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UHV-compatible solids
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Preparation
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Sample manipulator with five degrees of freedom; temperature control from 20 to 1500 K
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Sample environment
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UHV
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Scientific applications
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Angle- and spin-resolved photoemission
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Local contact
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Name: Alexei Fedorov
Phone: (510) 495-7521
Fax: (510) 486-4299
Email: avfedorov@lbl.gov
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Spokesperson
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Name: Dan Dessau
Affiliation: Univ. of Colorado at Boulder
Phone: (303) 492-1607
Fax: (303) 492-2998
Email: dessau@spot.colorado.edu
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Table of all beamlines
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