Operational

Now

Source characteristics

Bend magnet (7 horizontal mrad at 14 m from bend magnet)

Energy range

1 - 20 keV (Be low-energy cutoff filter)

Monochromator

None

Calculated flux (1.9 GeV, 400 mA)

2.7 x 10¹³ photons/s/0.1%BW

Endstations

Deep-etch x-ray lithography

Characteristics

Self-contained scanner endstation

Beam dimensions at sample

10 cm x 1.3 mm

Scientific applications

Research and development on deep-etch x-ray lithography such as LIGA (micromachining of high-aspect-ratio microstructures)

Local contacts

Name: Cheryl Hauck
Phone: (510) 486-7885
Fax: (510) 486-4102
Email: cahauck@lbl.gov

Name: Keith Jackson
Phone: (510) 486-6894
Fax: (510) 486-4955
Email: khjackson@lbl.gov

PRT Spokesperson

Name: Jill Hruby
Affiliation: Sandia National Laboratories
Phone: (925) 294-2596
Fax: (925) 294-3410
Email: jmhruby@sandia.gov