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Beamline 7.3.1.1

Magnetic Microscopy, Spectromicroscopy

Operational

Now

Source characteristics

Bend magnet

Energy range

175 - 1500 eV

Monochromator

SGM

Calculated flux (1.9 GeV, 400 mA)

3 x 1012 photons/s/0.1%BW at 800 eV (linearly polarized)

Resolving power (E/DE)

1800 at 800 eV

Endstations

Photoemission electron microscope (PEEM2)

Characteristics

Imaging of electron emission

Spatial resolution

20 nm (NEXAFS); 50 nm (XMCD)

Detectors

Slow scan CCD

Spot size at sample

Less than or equal to 30 x 30 µm

Samples

Format

UHV-compatible conductive solids up to 1 cm2 in area

Preparation

Sputtering, heating, evaporation, LEED, transfer capability, magnet (1000 Oe)

Sample environment

UHV

Special notes

Choice of linearly or circularly polarized radiation (flux of circularly polarized radiation is reduced)

Scientific applications

Real-time study of elemental, chemical, magnetic, and topographical properties of materials

Local contact

Name: Simone Anders
Phone: (510) 486-5928
Fax: (510) 486-7696
Email: sanders@lbl.gov

Spokesperson

Name: Joachim Stöhr
Affiliation: Stanford Synchrotron Radiation Laboratory
Phone: (650) 926-2570
Fax: (650) 926-4100
Email: stohr@ssrl.slac.stanford.edu

Table of all beamlines