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Beamline 8.0.1Surface and Materials Science, Imaging Photoelectron Spectroscopy,
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Operational |
Now |
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Source characteristics |
5-cm-period undulator (U5) |
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Energy range |
65 - 1400 eV (1.5 GeV); ~80 - 1400 eV (1.9 GeV) |
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Monochromator |
SGM (gratings: 150, 380, 925 lines/mm) |
| Flux (1.9 GeV, 400 mA) | ~1011 to 6 x 1015 photons/s |
| Resolving power (E/DE) |
< 8000 |
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Endstations |
Ellipsoidal-mirror electron energy analyzer (EMA) |
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Endstation |
Ellipsoidal-mirror electron energy analyzer (EMA) |
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Characteristics |
Measures 84° of electron emission angles from solid samples with 80-meV resolution |
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Spot size at sample |
100 µm |
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Samples |
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Format |
UHV-compatible solids up to 2.5 x 1 cm |
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Preparation |
In-situ resistive heating, ion sputtering, and evaporation |
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Sample environment |
UHV |
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Special notes |
Sample preparation chamber, transfer capabilities |
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Scientific applications |
Condensed matter science, surface science |
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Experimental techniques |
XPS, ARPES, NEXAFS |
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Local contact |
Name: Jonathan Denlinger |
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Spokesperson |
Name: Franz Himpsel |
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Endstation |
Soft x-ray fluorescence (SXF) spectrometer |
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Characteristics |
Measures the soft x-ray emission from solid samples |
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Spot size at sample |
100 (h) x 50 to 3000 (v) µm |
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Samples |
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Format |
UHV-compatible solids up to 2 cm in diameter; 5-mm diameter optimal |
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Sample environment |
UHV |
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Special notes |
Sample transfer capabilities |
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Experimental techniques |
SXF, NEXAFS, fluorescence-yield XAS of solids |
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Local contact |
Name: Jonathan Denlinger |
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Spokesperson |
Name: Thomas Callcott |