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Beamline 12.0.1

Surface and Materials Science, Spectromicroscopy,
EUV Optics Testing, Interferometry, Coherent Optics

Operational	Now
Source characteristics	8-cm-period undulator (U8)
Energy range	See endstation tables
Monochromator	See endstation tables
Endstations	MAXIMUM EUV interferometer EUV interferometer

Endstation	MAXIMUM
Characteristics	Scanning photoelectron microscope with multilayer optics
Energy range	95 and 130 eV
Monochromator	VLS-PGM
Calculated flux (1.9 GeV, 400 mA)	~6 x 10¹¹ photons/s/1%BW after 1-µm pinhole
Resolving power (E/DE)	200 - 1000
Spatial resolution	100 nm
Detectors	Cylindrical mirror analyzer, multichannel plate detector
Spot size at sample	0.1 µm
Samples
Format	UHV-compatible solids up to 15 x 15 mm
Preparation	Deposition, cleaving, ion beam sputtering, annealing
Sample environment	UHV; in-situ heating and electrical testing
Scientific applications	Semiconductor surfaces and interfaces, microelectronics, metallization, silicides
Local contact	Name: Yi Yang Phone: (510) 495-2121 Fax: (510) 486-7588 Email: yyang@lbl.gov
Spokesperson	Name: Franco Cerrina Affiliation: University of Wisconsin-Madison Phone: (608) 263-4955 Fax: (608) 265-3811 Email: cerrina@ece.wisc.edu

Endstation	EUV interferometer
Energy range	60 - 320 eV
Monochromator	VLS-PGM
Calculated flux (1.9 GeV, 400 mA)	~5 x 10¹³ photons/s/1%BW at 134 eV
Resolving power (E/DE)	200 - 1000
Detectors	GaAsP flux monitor, silicon 1024 x 1024 CCD array
Samples
Format	All-reflective, multilayer-coated EUV optics
Sample environment	10^-7 or 10^-4 Torr O₂
Scientific applications	Interferometric wavefront measurement of optics designed for EUV lithography
Local contact	Name: Kenneth A. Goldberg Phone: (510) 486-2261 Fax: (510) 486-4550 Email: kagoldberg@lbl.gov
Spokesperson	Name: Jeffrey Bokor Affiliation: U.C. Berkeley; Center for X-Ray Optics, Berkeley Lab Phone: (510) 642-4134 Fax: (510) 642-2739 Email: jbokor@eecs.berkeley.edu

Endstation	EUV interferometer
Energy range	60 - 320 eV
Monochromator	VLS-PGM
Calculated flux (1.9 GeV, 400 mA)	~5 x 10¹³ photons/s/1%BW at 134 eV
Resolving power (E/DE)	200 - 1000
Detectors	GaAsP flux monitor, silicon 1024 x 1024 CCD array
Samples
Format	All-reflective, multilayer-coated EUV optics
Sample environment	10^-7 or 10^-4 Torr O₂
Scientific applications	Interferometric wavefront measurement of optics designed for EUV lithography
Local contact	Name: Kenneth A. Goldberg Phone: (510) 486-2261 Fax: (510) 486-4550 Email: kagoldberg@lbl.gov
Spokesperson	Name: Jeffrey Bokor Affiliation: U.C. Berkeley; Center for X-Ray Optics, Berkeley Lab Phone: (510) 642-4134 Fax: (510) 642-2739 Email: jbokor@eecs.berkeley.edu

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