|
Beamline
|
Source*
|
Areas of Research/Techniques
|
Energy Range
|
Available
|
|
1.4.1
|
Bend |
Ultraviolet photoluminescence
|
1.6-6.2 eV |
Now |
|
1.4.2
|
Bend |
Visible and infrared Fourier transform spectroscopy (FTIR)
|
0.002-3 eV |
Now |
|
1.4.3
|
Bend |
Infrared spectromicroscopy
|
0.05-1 eV |
Now |
|
3.1
|
Bend |
Diagnostic beamline
|
200-280 eV |
Now |
|
3.3.2
|
Bend |
Deep-etch x-ray lithography (LIGA)
|
1-20 keV |
Now |
|
4.0.1-2
|
EPU5 |
Magnetic spectroscopy
|
60-1800 eV |
Now |
|
5.0.1
|
W16 |
Monochromatic protein crystallography
|
12.4 keV |
2000 |
|
5.0.2
|
W16 |
Multiple-wavelength anomalous diffraction (MAD) and monochromatic protein crystallography
|
3.5-14 keV |
Now |
|
5.0.3
|
W16 |
Monochromatic protein crystallography
|
12.4 keV |
2000 |
|
5.3.1
|
Bend |
Femtosecond phenomena
|
0.1-12 keV |
2000 |
|
5.3.2
|
Bend |
Polymer scanning transmission x-ray microscopy
|
150-650 eV |
2000 |
|
6.1.2
|
Bend |
High-resolution zone-plate microscopy
|
300-800 eV |
Now |
|
6.3.1
|
Bend |
Calibration and standards, EUV/soft x-ray optics testing, solid-state chemistry
|
500-2000 eV |
Now |
|
6.3.2
|
Bend |
Calibration and standards; EUV optics testing; atomic, molecular, and materials science
|
50-1300 eV |
Now |
|
7.0.1
|
U5 |
Surface and materials science, spectromicroscopy, spin resolution, photon-polarization dichroism
|
50-1200 eV |
Now |
|
7.3.1.1
|
Bend |
Magnetic microscopy, spectromicroscopy
|
175-1500 eV |
Now |
|
7.3.1.2
|
Bend |
Surface and materials science, micro x-ray photoelectron spectroscopy
|
175-1500 eV |
Now |
|
7.3.3
|
Bend |
Micro x-ray diffraction, micro x-ray absorption spectroscopy, hard x-ray optics testing
|
6-12 keV |
Now |
|
8.0.1
|
U5 |
Surface and materials science, imaging photoelectron spectroscopy, soft x-ray fluorescence
|
65-1400 eV |
Now |
|
9.0.1
|
U10 |
Coherent optics experiments
|
200-800 eV |
Now |
|
9.0.2
|
U10 |
Chemical reaction dynamics, photochemistry, high-resolution photoelectron and photoionization spectroscopy, photoelectron and photoionization imaging and spectroscopy
|
5-30 eV |
Now |
|
9.3.1
|
Bend |
Atomic, molecular, and materials science
|
2.2-6 keV |
Now |
|
9.3.2
|
Bend |
Chemical and materials science, circular dichroism, spin resolution
|
30-1400 eV |
Now |
|
10.0.1
|
U10 |
Photoemission of highly correlated materials; high-resolution atomic, molecular, and optical physics
|
17-340 eV |
Now |
|
10.3.1
|
Bend |
X-ray fluorescence microprobe
|
3-20 keV |
Now |
|
10.3.2
|
Bend |
Environmental and materials science, micro x-ray absorption spectroscopy
|
3-17 keV |
2000 |
|
11.3.2
|
Bend |
Inspection of EUV lithography masks
|
50-1000 eV |
Now |
|
12.0.1
|
U8 |
Surface and materials science, spectromicroscopy, EUV optics testing, interferometry, coherent optics
|
60-320 eV |
Now |
|
BTF
|
Linac |
Beam Test Facility
|
50-MeV electrons |
Now |