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Table of Beamlines at the ALS

Beamline

Source*

Areas of Research/Techniques

Energy Range

Available

1.4.1

Bend

Ultraviolet photoluminescence

1.6-6.2 eV Now

1.4.2

Bend

Visible and infrared Fourier transform spectroscopy (FTIR)

0.002-3 eV Now

1.4.3

Bend

Infrared spectromicroscopy

0.05-1 eV Now

3.1

Bend

Diagnostic beamline

200-280 eV Now

3.3.2

Bend

Deep-etch x-ray lithography (LIGA)

1-20 keV Now

4.0.1-2

EPU5

Magnetic spectroscopy

60-1800 eV Now

5.0.1

W16

Monochromatic protein crystallography

12.4 keV 2000

5.0.2

W16

Multiple-wavelength anomalous diffraction (MAD) and monochromatic protein crystallography

3.5-14 keV Now

5.0.3

W16

Monochromatic protein crystallography

12.4 keV 2000

5.3.1

Bend

Femtosecond phenomena

0.1-12 keV 2000

5.3.2

Bend

Polymer scanning transmission x-ray microscopy

150-650 eV 2000

6.1.2

Bend

High-resolution zone-plate microscopy

300-800 eV Now

6.3.1

Bend

Calibration and standards, EUV/soft x-ray optics testing, solid-state chemistry

500-2000 eV Now

6.3.2

Bend

Calibration and standards; EUV optics testing; atomic, molecular, and materials science

50-1300 eV Now

7.0.1

U5

Surface and materials science, spectromicroscopy, spin resolution, photon-polarization dichroism

50-1200 eV Now

7.3.1.1

Bend

Magnetic microscopy, spectromicroscopy

175-1500 eV Now

7.3.1.2

Bend

Surface and materials science, micro x-ray photoelectron spectroscopy

175-1500 eV Now

7.3.3

Bend

Micro x-ray diffraction, micro x-ray absorption spectroscopy, hard x-ray optics testing

6-12 keV Now

8.0.1

U5

Surface and materials science, imaging photoelectron spectroscopy, soft x-ray fluorescence

65-1400 eV Now

9.0.1

U10

Coherent optics experiments

200-800 eV Now

9.0.2

U10

Chemical reaction dynamics, photochemistry, high-resolution photoelectron and photoionization spectroscopy, photoelectron and photoionization imaging and spectroscopy

5-30 eV Now

9.3.1

Bend

Atomic, molecular, and materials science

2.2-6 keV Now

9.3.2

Bend

Chemical and materials science, circular dichroism, spin resolution

30-1400 eV Now

10.0.1

U10

Photoemission of highly correlated materials; high-resolution atomic, molecular, and optical physics

17-340 eV Now

10.3.1

Bend

X-ray fluorescence microprobe

3-20 keV Now

10.3.2

Bend

Environmental and materials science, micro x-ray absorption spectroscopy

3-17 keV 2000

11.3.2

Bend

Inspection of EUV lithography masks

50-1000 eV Now

12.0.1

U8

Surface and materials science, spectromicroscopy, EUV optics testing, interferometry, coherent optics

60-320 eV Now

BTF

Linac

Beam Test Facility

50-MeV electrons Now

* Bend = bend magnet; EPU5 = 5-cm-period elliptical polarization undulator;
W16 = 16-cm-period wiggler; Ux = x-cm-period undulator

1999 Compendium Index