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Beamline 11.3.2

Inspection of EUV lithography masks

Operational

Now

Source characteristics

Bend magnet

Energy range

50–1000 eV

Monochromator

VLS-PGM

Calculated flux (1.9 GeV, 400 mA)

1011 photons/s/0.01%BW at 100 eV

Resolving power (E/ΔE)

7000

Endstations

Scanning bright field and dark field EUV mask inspection and aerial image microscope

Spot size at sample

1–5 microns

Local contact

Name: Kenneth Goldberg
Affiliation: Center for X-Ray Optics, Berkeley Lab
Phone: (510) 495-2261
Fax: (510) 486-4550

Beamline phone number

(510) 495-2113

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