Operational

Now

Source characteristics

Bend magnet

Energy range

3-12 keV

Monochromator

None

Endstations

Hutch with automated scanner

Calculated spot size at sample

100 x 10 mm

Samples

Format

3- and 4-in. wafer format; x-ray mask and LIGA substrate

Sample environment

Ambient, air

Scientific applications

Deep-etch x-ray lithography (LIGA)

Spokesperson

Name: John Krafcik
Affiliation: AXSUN Technologies Inc.
Phone: (925) 373-3174, ext. 103
Fax: (925) 373-3178
Email: jkrafcik@axsun.com

Beamline phone number

(510) 495-2032