Beamline 7.0.1
Surface and Materials Science, Spectromicroscopy
Operational |
Now |
Source characteristics |
5-cm-period undulator (U5) (first, third, and fifth harmonics) |
Energy range |
See endstation tables |
Monochromator |
See endstation tables |
Endstations |
Scanning photoemission microscope (SPEM) |
Beamline phone numbers |
(510) 495-2070, (510) 495-2071, (510) 495-2079 |
| Scanning photoemission microscope (SPEM) |
|
Characteristics |
Designed for submicron XPS |
Energy range |
100-800 eV |
Monochromator |
SGM (gratings: 150, 380, 925 lines/mm) |
Calculated flux (1.9 GeV, 400 mA) |
~108-109 photons/s/0.01% BW |
Resolving power (E/ΔE) |
3000 |
Spatial resolution |
Scanning microscope with focusing by means of Fresnel zone plates; resolution determined by spot size, which is 150 nm with current zone plates but will improve with new zone plates |
Detectors |
Hemispherical electron energy analyzer; total electron yield detector |
Spot size at sample |
150 nm with current zone plates |
Samples |
|
Format |
UHV-compatible solids up to 25 mm in diameter |
Preparation |
Preparation chamber with sputtering and annealing provided |
Sample environment |
UHV |
Special notes |
Optical alignment equipment provided so that visible marks on the sample surface can be used to find an area of interest prior to x-ray measurements; in-situ heating and cooling |
Experimental techniques |
XPS, NEXAFS, imaging of areas up to 100 µm across |
Local contact/spokesperson |
Name: Eli Rotenberg |
| Electronic Structure Factory (ESF) |
|
Characteristics |
High-resolution, angle-resolved XPS spectroscopy; capable of making images by rastering the sample through a fixed spot; sample is rotated for angle-resolved measurements |
Energy range |
60-1200 eV |
Monochromator |
SGM (gratings: 150, 380, 925 lines/mm) |
Calculated flux (1.9 GeV, 400 mA) |
~1012 photons/s/0.01% BW (resolution dependent) |
Resolving power (E/ΔE) |
less than or equal to 8000 |
Detectors |
SES-100 hemispherical electron energy analyzer |
Spot size at sample |
50 µm |
| Angular resolution | 0.1 degree |
Samples |
|
Format |
UHV-compatible solids up to 25 mm in diameter |
Preparation |
Preparation chamber with Leed, sputtering, heating, magnetization coil, transition and other metal sources, ESCA with Mg and Al anode source |
Sample environment |
UHV |
Special notes |
LEED and in-situ sample heating and cooling available |
Scientific applications |
Band structure determination and photoelectron diffraciton; condensed matter science, surface science, correlated materials, magentic systems |
Experimental techniques |
XPS, XPD, NEXAFS |
| Web site | http://www-bl7.lbl.gov/BL7/endstations/esf.html |
Local contact/spokesperson |
Name: Eli Rotenberg |
| Advanced x-ray inelastic scattering (AXIS) |
|
Characteristics |
Grating spectrometer for high-resolution (1:2000) photon-in/photon-out spectroscopy |
Energy range |
80-1200 eV |
Monochromator |
SGM (gratings: 150, 380, 925 lines/mm) |
Calculated flux (1.9 GeV, 400 mA) |
3 x 1012 photons/s/0.01% BW (resolution dependent) |
Resolving power (E/ΔE) |
<5000 |
Detectors |
Micro-channel-plate photon counter in spectrometer focal plane; channeltron fluorescence detector |
Spot size at sample |
50 µm |
Samples |
|
Format |
UHV-compatible solids up to 25 mm in diameter or gases and liquids in windowed cells |
Preparation |
No preparation chamber provided |
Sample environment |
UHV |
Special notes |
This spectrometer is installed by the group from the University of Uppsala, Sweden. |
Experimental techniques |
XES, RIXS, NEXAFS |
Local contact/spokesperson |
Name: Jinghua Guo |
Several data sheets about this beamline are available as PDF files.
High-Resolution, High-Flux Facility for Spectromicroscopy
Scanning Photoemission Microscope (SPEM)
More information about this beamline is available at the Beamline 7.0 Web site.
Table of all beamlines
Diagram of all beamlines