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Beamline 7.3.1.1

Magnetic Microscopy, Spectromicroscopy

Operational

Now

Source characteristics

Bend magnet

Energy range

175-1500 eV

Monochromator

SGM

Calculated flux (1.9 GeV, 400 mA)

3 x 1012 photons/s/0.1%BW at 800 eV (linearly polarized)

Resolving power (E/ΔE)

1800 at 800 eV

Endstations

Photoemission electron microscope (PEEM2)

Characteristics

X-ray absorption spectromicroscopy, psec laser for time-resolved studies

Spatial resolution

Better than 50 nm depending on sample; 100 nm typical

Detectors

Slow scan CCD

Spot size at sample

less than or equal to 30 x 30 µm

Samples

 

Format

UHV-compatible flat, conductive samples up to 1 cm2 in area

Preparation

Sputter-cleaning, heating, e-beam and sputter evaporation, LEED, transfer capability, magnet (1 kOe)

Sample environment

UHV

Special notes

Choice of linearly or circularly polarized radiation (flux of circularly polarized radiation is reduced)

Scientific applications

Real-time and pump-probe study of elemental, chemical, magnetic, and topographical properties of materials

Local contact

Name: Andreas Scholl
Phone: (510) 486-4867
Fax: (510) 486-7696
Email: a_scholl@lbl.gov

Spokesperson

Name: Joachim Stöhr
Affiliation: Stanford Synchrotron Radiation Laboratory
Phone: (650) 926-2570
Fax: (650) 926-4100
Email: stohr@ssrl.slac.stanford.edu

Beamline phone number

(510) 495-2073

A data sheet about this beamline is available as a PDF file.

Table of all beamlines
Diagram of all beamlines