Operational |
Now |
Source characteristics |
Bend magnet |
Energy range |
175-1500 eV |
Monochromator |
SGM |
Calculated flux (1.9 GeV, 400 mA) |
3 x 1012 photons/s/0.1%BW at 800 eV (linearly polarized) |
Resolving power (E/ΔE) |
1800 at 800 eV |
Endstations |
Photoemission electron microscope (PEEM2) |
Characteristics |
X-ray absorption spectromicroscopy, psec laser for time-resolved
studies |
Spatial resolution |
Better than 50 nm depending on sample; 100 nm typical |
Detectors |
Slow scan CCD |
Spot size at sample |
less than or equal to 30 x 30 µm |
Samples |
|
Format |
UHV-compatible flat, conductive samples up to 1 cm2
in area |
Preparation |
Sputter-cleaning, heating, e-beam and sputter evaporation, LEED,
transfer capability, magnet (1 kOe) |
Sample environment |
UHV |
Special notes |
Choice of linearly or circularly polarized radiation (flux of circularly
polarized radiation is reduced) |
Scientific applications |
Real-time and pump-probe study of elemental, chemical, magnetic,
and topographical properties of materials |
Local contact |
Name: Andreas Scholl
Phone: (510) 486-4867
Fax: (510) 486-7696
Email: a_scholl@lbl.gov |
Spokesperson |
Name: Joachim Stöhr
Affiliation: Stanford Synchrotron Radiation Laboratory
Phone: (650) 926-2570
Fax: (650) 926-4100
Email: stohr@ssrl.slac.stanford.edu |
Beamline phone number |
(510) 495-2073 |