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Tuesday, 20 October 2009 09:23 |
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EUV optics testing and interferometry, angle- and spin-resolved photoemission
Scientific discipline: Applied science, correlated electron systems
Endstations:
| ENDSTATION INFORMATION |
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Endstation name
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Angle- and spin-resolved photoemission (12.0.1.1)
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Operational
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Yes
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Energy range
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25–300 eV
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Monochromator
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VLS-PGM (200-, 300-, 600-, and 1200-line/mm gratings)
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Calculated flux (1.9 GeV, 400 mA)
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1014 photons/s/1%BW at 100 eV
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Resolving power (E/ΔE)
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Grating-dependent, typically from 5,000 to 10,000
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| Spatial resolution |
10 microns |
| Spot size at sample |
80 x 100 microns |
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Detectors
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Scienta SES-100 (angle-resolved photoemission), R3000, R4000
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Sample format
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UHV-compatible solids
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Sample preparation
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Sample manipulator with five degrees of freedom; temperature control from 10 to 375 K
Evaporation, ion sputtering, high-temperature annealing, UHV cleave
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Sample environment
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UHV
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Scientific applications
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Band structure measurements
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| Scientific disciplines |
Applied science, correlated electron system |
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Local contact
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Advanced Light Source, Berkeley Lab
Phone: (510) 486-7521
Fax: (510) 495-2067
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Spokesperson
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This e-mail address is being protected from spambots. You need JavaScript enabled to view it
Univ. of Colorado at Boulder
Phone: (303) 492-1607
Fax: (303) 492-2998
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| Website |
http://ssg.als.lbl.gov/ssgbeamlines/beamline12-0-1
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| ENDSTATION INFORMATION |
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Endstation name
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Berkeley Dose Calibration Tool (DCT) (12.0.1.2)
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Operational
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Now, not open to users
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Energy range
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25-300 eV
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Monochromator
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VLS-PGM
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Calculated flux (1.9 GeV, 400 mA)
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~5 x 1013 photons/s/1%BW at 134 eV
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Resolving power (E/ΔE)
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200-10,000
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| Spatial resolution |
15 nm |
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Detectors
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GaAsP flux monitor, silicon 1024 x 1024 CCD array
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| Characteristics |
0.3-NA EUV lithography tool |
| Sample format |
Resist-coated silicon wafers, and 6" EUV masks |
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Sample preparation
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Cleanroom handling
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Sample environment
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10-8 Torr
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| Sample handling automation |
Load-lock transfer |
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Scientific applications
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Absolute dose calibration of EUV photoresists
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| Scientific disciplines |
Applied science |
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Local contact / Spokesperson
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This e-mail address is being protected from spambots. You need JavaScript enabled to view it
Center for X-Ray Optics, Berkeley Lab
Phone: (510) 486-5288
Fax: (510) 486-4550
This e-mail address is being protected from spambots. You need JavaScript enabled to view it
Center for X-Ray Optics, Berkeley Lab
Phone: (510) 486-4529
Fax: (510) 486-4550
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| Website |
http://www.cxro.lbl.gov |
| ENDSTATION INFORMATION |
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Endstation name
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SEMATECH Berkeley Microfield Exposure Tool (MET) (12.0.1.3)
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Operational
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Yes, but not open to users
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Energy range
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25-300 eV
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Monochromator
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VLS-PGM
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Calculated flux (1.9 GeV, 400 mA)
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~5 x 1013 photons/s/1%BW at 134 eV
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Resolving power (E/ΔE)
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200-10,000
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| Spatial resolution |
1 mm |
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Detectors
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GaAsP flux monitor, silicon 1024 x 1024 CCD array
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| Characteristics |
Absolute sensitivity calibration |
| Sample format |
Resist-coated silicon wafers |
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Sample preparation
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Cleanroom handling
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Sample environment
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10-7 Torr
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Scientific applications
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EUV lithography and EUV photoresist screening
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| Scientific disciplines |
Applied science |
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Local contact / Spokesperson
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This e-mail address is being protected from spambots. You need JavaScript enabled to view it
Center for X-Ray Optics, Berkeley Lab
Phone: (510) 486-5288
Fax: (510) 486-4550
This e-mail address is being protected from spambots. You need JavaScript enabled to view it
Center for X-Ray Optics, Berkeley Lab
Phone: (510) 486-4529
Fax: (510) 486-4550
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| Website |
http://www.cxro.lbl.gov |
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