| Beamline Number | Source
| Technique/ Group Name | Energy Range | Beamline Contact | Schedule/BL Phone |
| 1.4.3 |
Bend |
Infrared spectromicroscopy |
0.05–1.2 eV |
This e-mail address is being protected from spambots. You need JavaScript enabled to view it
(510) 495-2231 |
BL Web Site
x2014
|
| 1.4.4 |
Bend |
Infrared spectromicroscopy |
0.05–1.2 eV |
BL Web Site
x2014
|
| 2.1 |
Bend |
National Center for X-Ray Tomography (NCXT)
|
400 - 1300 eV |
This e-mail address is being protected from spambots. You need JavaScript enabled to view it
(510) 486-6892 |
x5198 |
| 3.1 |
Bend |
Diagnostic beamline Note: This beamline is NOT open to general users. |
1-2 keV |
W. Byrne (510) 486-7517 |
x2031 |
| 3.2.1 |
Bend |
Commercial deep-etch x-ray lithography (LIGA) Note: This beamline is NOT open to general users. |
3-12 keV |
This e-mail address is being protected from spambots. You need JavaScript enabled to view it
|
x2032 |
| 4.0.2 |
EPU5 |
Magnetic spectroscopy |
400-1500 eV |
This e-mail address is being protected from spambots. You need JavaScript enabled to view it
(510) 486-4834
This e-mail address is being protected from spambots. You need JavaScript enabled to view it
(510) 486-5926
|
Jan-Jul 2013
x2041
|
| 4.0.3 |
EPU9 |
High-resolution spectroscopy of complex materials (MERLIN)
|
9-100 eV |
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(510) 495-2328
This e-mail address is being protected from spambots. You need JavaScript enabled to view it
(510) 486-5648 |
Jan-July, 2013
x2041
|
| 4.2.2 |
Superbend |
Multiple-wavelength anomalous diffraction (MAD) and macromolecular crystallography (MX) |
5,500-16,000 eV |
This e-mail address is being protected from spambots. You need JavaScript enabled to view it
(707) 567-7535
|
x6652 |
| 5.0.1 |
W11 |
Macromolecular crystallography (MX) |
12,700 eV |
P. Zwart (510) 486-4214
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(510) 495-2926
|
BL Web Site
x2051
|
| 5.0.2 |
W11 |
Multiple-wavelength anomalous diffraction (MAD) and macromolecular crystallography (MX) |
5-16 keV |
BL Web Site
x2052
|
| 5.0.3 |
W11 |
Macromolecular crystallography (MX) |
12,700 eV |
BL Web Site
x2054
|
| 5.3.1 |
Bend |
Instrumentation development Note: This beamline is NOT open to general users. |
1,000 - 13,000 eV |
This e-mail address is being protected from spambots. You need JavaScript enabled to view it
(510) 495-2053 |
x2031 |
| 5.3.2 |
Bend |
Polymer scanning transmission x-ray microscopy (STXM) |
250-800 eV |
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(510) 486-4640 |
Jan-Jul 2013
x2057
|
| 5.4.1 |
Bend |
IR spectromicroscopy
|
0.07–1.25 eV |
This e-mail address is being protected from spambots. You need JavaScript enabled to view it
(510) 495-2231 |
x2654 |
| 5.4.3 |
Bend |
High resolution far-IR to mid-IR spectroscopy
|
0.0025–1.5 eV |
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(510) 495-2231 |
-- |
| 6.0.1 |
U3 |
Ultrafast/femtosecond dynamics hard x-ray
|
2.3-9 keV |
M. Hertlein E. Glover A. Scholl |
Jan-Jul 2013
x2087
|
| 6.0.2 |
U3 |
Ultrafast/femtosecond dynamics soft x-ray |
250 eV- 2 keV |
|
| 6.1.2 |
Bend |
Soft x-ray microscopy |
500-1300 eV |
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(510) 486-7052 |
x2061
|
| 6.3.1 |
Bend |
Magnetic spectroscopy |
400-2000 eV |
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(510) 486-5926
This e-mail address is being protected from spambots. You need JavaScript enabled to view it
(510) 486-4834
Per-Anders Glans
(510) 486-7336
|
Jan-Jul 2013
x2062
|
| 6.3.2 |
Bend |
EUV calibrations |
25-1300 eV |
This e-mail address is being protected from spambots. You need JavaScript enabled to view it
(510) 486-6646 |
x2063 |
| 7.0.1 |
U5 |
Surface and materials science, spectromicroscopy |
78-1200 eV |
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(510) 495-2230
This e-mail address is being protected from spambots. You need JavaScript enabled to view it
(510) 486-5975
This e-mail address is being protected from spambots. You need JavaScript enabled to view it
(510) 486-4816 |
BL Web Site 
x2070
x2079
x2071
|
| 7.2 |
Bend |
Diagnostic beamline Note: This beamline is NOT open to general users. |
Far IR- 17 keV |
F. Sannibale (510) 486-5924 |
x2073 |
| 7.3.1 |
Bend |
Note: This beamline is NOT open to general users. |
180-1500 eV |
This e-mail address is being protected from spambots. You need JavaScript enabled to view it
(510) 486-6920 |
x2073
|
| 7.3.3 |
Bend |
Small- and wide-angle x-ray scattering (SAXS/WAXS) |
10 keV |
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(510) 486-6435
This e-mail address is being protected from spambots. You need JavaScript enabled to view it
(510) 495-2665 |
BL Web Site
x2075
x2076
|
| 8.0.1 |
U5 |
Surface and materials science, wet-RIXS, soft x-ray fluorescence |
65-1400 eV |
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(510) 495-2080 (510) 495-2089
This e-mail address is being protected from spambots. You need JavaScript enabled to view it
(510) 495-2230
|
Jan-Jul 2013
x2080
x2089
|
| 8.2.1 |
Superbend |
Multiple-wavelength anomalous diffraction (MAD) and macromolecular crystallography (MX) |
5-16 keV |
This e-mail address is being protected from spambots. You need JavaScript enabled to view it
(510) 495-2081 (510) 495-2082 |
BL Web Site
x2080
|
| 8.2.2 |
Superbend |
Multiple-wavelength anomalous diffraction (MAD) and macromolecular crystallography (MX) |
5-16 keV |
BL Web Site
x2082
|
| 8.3.1 |
Superbend |
Multiple-wavelength anomalous diffraction (MAD) and macromolecular crystallography (MX) |
5-17 keV |
This e-mail address is being protected from spambots. You need JavaScript enabled to view it
(510) 486-4587 J Tanamachi (510) 495-2404 G. Meigs (510) 495-2249 |
x2083 |
| 8.3.2 |
Superbend |
Hard x-ray microtomography |
6-46keV
|
A.
MacDowell (510) 486-4276
This e-mail address is being protected from spambots. You need JavaScript enabled to view it
(510) 495-2856
|
BL Web Site
x2005
|
| 9.0.1 |
U10 |
Diffraction microscopy
|
500-1500 eV |
D. Shapiro (510) 486-7628
|
x2091 |
| 9.0.2 |
U10 |
Chemical dynamics |
7.5-25 eV |
M. Ahmed (510) 486-6355 K. Wilson (510) 495-2474 |
BL Web Site
x2092
|
| 9.3.1 |
Bend |
Atomic, molecular, and materials science Note: This beamline is NOT open to general users.
|
2320-5600eV |
W. Stolte (510) 486-5804 |
Jan-Jul 2013
x2094
|
| 9.3.2 |
Bend |
Chemical and materials |
30-850 eV |
Z. Liu (510) 486-5471 M. Grass (510) 486-2733
|
Jan-Jul 2013
x2109
|
| 10.0.1 |
U10 |
Photoemission of highly correlated materials; high-resolution atomic, molecular, and optical physics |
17-350 eV |
(HERS) Sung-Kwan Mo (510) 495-2903 (IPB/ESP/HiRAMES) A. Aguilar (510) 486-6235 D. Kilcoyne (510) 486-4640 |
Jan-Jul 2013
x2101
x2102
|
| 10.3.1 |
Bend |
X-ray fluorescence microprobe Note: This beamline is NOT open to general users. |
3–20 keV |
S. Cliff (530) 867-2037
|
x2104 |
| 10.3.2 |
Bend |
Environmental and materials science, micro x-ray absorption spectroscopy (µXAS, µEXAFS) |
2.4-17 keV |
M. Marcus (510) 495-2106 S. Fakra (510) 495-2106 |
Jan-Jul 2013
x2106
|
| 11.0.1 |
EPU 5 |
PEEM3, soft x-ray scattering
|
150–2000 eV |
A. Scholl (510) 486-6920 T. Young (510) 486-7746 |
Jan-July 2013
x2010
|
| 11.0.2 |
EPU5 |
Molecular environmental science |
95-2000 eV |
D. Shuh T. Tyliszczak (510) 495-2077 |
Jan-Jul 2013
x2077
|
| 11.3.1 |
Bend |
Small-molecule crystallography |
6-17 keV |
S. Teat (510) 486-4457
|
Jan-Jul 2013
x2117
|
| 11.3.2 |
Bend |
Inspection of EUV lithography masks Note: This beamline is NOT open to general users.
|
50-1000 eV |
K. Goldberg (510) 495-2261 P. Naulleau (510) 486-4529 |
|
| 12.0.1 |
U8 |
EUV optics testing and interferometry, angle- and spin-resolved photoemission |
25-300 eV |
(ARPES) A. Fedorov (510) 486-7521 (DCT/ MET) P. Naulleau (510) 486-4529 C. Anderson (510) 486-5288 |
Jan-Jul 2013
x2121
x2120
|
| 12.0.2 |
U8 |
Coherent science |
300–1500 eV |
S. Roy (510) 486-7438 P. Naulleau (510) 486-4529 |
x2107
|
| 12.2.2 |
Superbend |
High-Pressure XRD |
6-40 keV |
A.
MacDowell
(510) 486-4276
S. Clark (510) 495-2442
J. Knight
(510) 495-2716
|
BL Web Site
x2055
|
| 12.3.1 |
Superbend |
Structurally integrated biology for life sciences (SIBYLS) |
5-17 keV |
G. Hura (510) 486-5378 M. Hammel (510) 486-5378 S. Classen (510) 495-2697 |
x2134 |
| 12.3.2 |
Superbend |
Microdiffraction |
6–22 keV |
N. Tamura (510) 486-6189 M. Kunz (510) 486-6789 |
Jan-Jul 2013
x4625
|