|
Surface and Materials Science, Spectromicroscopy
Scientific disciplines: Correlated electron system, materials science
Endstations:
| GENERAL BEAMLINE INFORMATION |
|
Operational
|
Yes
|
| Proposal cycle |
Proposals for General Sciences Beamlines (6-month cycle) |
|
Source characteristics
|
5-cm period undulator (U5) (first, third, and fifth harmonics)
|
|
Energy range
|
See endstation tables
|
|
Monochromator
|
See endstation tables
|
| Scientific disciplines |
Correlated electron system, materials science |
| Website |
Beamline 7: http://www-bl7.lbl.gov/  |
| ENDSTATION INFORMATION |
|
Endstation name
|
nanoARPES
|
| Operational |
This instrument is currently under development. Expected user operation in 2012. For consideration, speak to the beamline scientist before applying for beamtime. |
|
Characteristics
|
Designed for submicron XPS
|
|
Energy range
|
100-800 eV
|
|
Monochromator
|
SGM (gratings: 150, 380, 925 lines/mm)
|
|
Calculated flux (1.9 GeV, 400 mA)
|
~108-109 photons/s/0.01% BW
|
|
Resolving power (E/ΔE)
|
3000
|
|
Spatial resolution
|
Scanning microscope with focusing by means of Fresnel zone plates; resolution determined by spot size, which is 150 nm with current zone plates but will improve with new zone plates
|
|
Detectors
|
Hemispherical electron energy analyzer; total electron yield detector
|
|
Spot size at sample
|
300-500 nm with current zone plates
|
|
Sample format
|
UHV-compatible solids up to 25 mm in diameter. Must be conducting.
|
|
Sample preparation
|
Preparation chamber with sputtering and annealing provided
|
|
Sample environment
|
UHV
|
|
Special notes
|
Optical alignment equipment provided so that visible marks on the sample surface can be used to find an area of interest prior to x-ray measurements; in-situ heating and cooling
|
|
Experimental techniques
|
XPS, NEXAFS, imaging of areas up to 100 µm across
|
|
Local contact / Spokesperson
|
This e-mail address is being protected from spambots. You need JavaScript enabled to view it
Advanced Light Source, Berkeley Lab
Phone: (510) 486-5975
Fax: (510) 486-7696
|
| Beamline phone number |
(510) 495-2070 |
| ENDSTATION INFORMATION |
|
Endstation name
|
Electronic Structure Factory (ESF)
|
| Operational |
Yes |
|
Characteristics
|
High-resolution, angle-resolved XPS spectroscopy; capable of making images by rastering the sample through a fixed spot; sample is rotated for angle-resolved measurements
|
|
Energy range
|
78-1200 eV
|
|
Monochromator
|
SGM (gratings: 150, 380, 925 lines/mm)
|
|
Calculated flux (1.9 GeV, 400 mA)
|
~1012 photons/s/0.01% BW (resolution dependent)
|
|
Resolving power (E/ΔE)
|
less than or equal to 8000
|
|
Detectors
|
Scienta R4000
|
|
Spot size at sample
|
50 µm x 50 µm
|
| Angular resolution |
0.1 degree |
|
Sample format
|
UHV-compatible solids up to 25 mm in diameter
|
|
Sample preparation
|
Preparation chamber with Leed, sputtering, heating, magnetization coil, transition and other metal sources, ESCA with Mg and Al anode source
|
|
Sample environment
|
UHV, 10-11 torr, <12K - 400K
|
|
Special notes
|
LEED and in-situ sample heating and cooling available
|
|
Scientific applications
|
Band structure determination and photoelectron diffraciton; condensed matter science, surface science, correlated materials, magentic systems
|
|
Experimental techniques
|
XPS, XPD, NEXAFS
|
| Web site |
http://www-bl7.lbl.gov/BL7/endstations/esf.html |
|
Local contact / Spokesperson
|
This e-mail address is being protected from spambots. You need JavaScript enabled to view it
Advanced Light Source, Berkeley Lab
Phone: (510) 486-5975
Fax: (510) 486-7696
|
| Beamline phone number |
(510) 495-2071 |
| ENDSTATION INFORMATION |
|
Endstation name
|
Advanced x-ray inelastic scattering (AXIS)
|
| Operational |
Yes |
|
Characteristics
|
Grating spectrometer for high-resolution (1:2000) photon-in/photon-out spectroscopy
|
|
Energy range
|
80-1200 eV
|
|
Monochromator
|
SGM (gratings: 150, 380, 925 lines/mm)
|
|
Calculated flux (1.9 GeV, 400 mA)
|
3 x 1012 photons/s/0.01% BW (resolution dependent)
|
|
Resolving power (E/ΔE)
|
<5000
|
|
Detectors
|
Micro-channel-plate photon counter in spectrometer focal plane; channeltron fluorescence detector
|
|
Spot size at sample
|
50 µm x 50 µm
|
|
Sample format
|
UHV-compatible solids up to 25 mm in diameter or gases and liquids in windowed cells
|
|
Sample preparation
|
No preparation chamber provided
|
|
Sample environment
|
UHV
|
|
Special notes
|
This spectrometer is installed by the group from the University of Uppsala, Sweden. |
|
Experimental techniques
|
XES, RIXS, NEXAFS
|
|
Local contact / Spokesperson
|
This e-mail address is being protected from spambots. You need JavaScript enabled to view it
Advanced Light Source, Berkeley Lab
Phone: (510) 495-2230
Fax: (510) 495-2067
|
| Beamline phone number |
(510) 495-2079 |
More information about this beamline is available at the Beamline 7.0 Web site .
|
