Operational

Yes, but not open to users

Source characteristics

Bend magnet

Energy range

3-12 keV

Monochromator

None

Endstations

Hutch with automated scanner

Calculated spot size at sample

100 x 10 mm

Sample format

3- and 4-in. wafer format; x-ray mask and LIGA substrate

Sample environment

Ambient, air

Scientific applications

Deep-etch x-ray lithography (LIGA)

Spokesperson

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Advanced Light Source, Berkeley Lab
Phone: (510) 486-5527
Fax: (510) 486-4102

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AXSUN Technology
Phone: (978) 439-3590

Beamline phone number

(510) 495-2032