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Inspection of EUV lithography masks
| GENERAL BEAMLINE INFORMATION |
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Operational
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Yes, but not open to users
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Source characteristics
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Bend magnet
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Energy range
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50–1000 eV
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Monochromator
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VLS-PGM
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Calculated flux (1.9 GeV, 400 mA)
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1011 photons/s/0.01%BW at 100 eV
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Resolving power (E/ΔE)
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7000
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Endstations
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The SEMATECH Berkeley Actinic Inspection Tool
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| Detector |
2048 x 2048 EUV CCD |
| Characteristics |
900-1000x zoneplate microscope |
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Spot size at sample
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1–5 microns
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| Spatial resolution |
60 nm |
| Sample format |
EUV Photolithography masks: 6" glass plate, multilayer coated for normal incidence reflectivity at 13.4 nm |
| Sample preparation |
Cleanroom handling |
| Sample environment |
2.0 x 10-7 Torr base pressure |
| Scientific applications |
EUV lithography |
Local contacts/ Spokespersons
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Center for X-Ray Optics, Berkeley Lab
Phone: (510) 495-2261
Fax: (510) 486-4550 |
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Center for X-Ray Optics, Berkeley Lab
Phone: (510) 486-6622
Fax: (510) 486-4550 |
Name:
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Center for X-Ray Optics, Berkeley Lab
Phone: (510) 486-6921
Fax: (510) 486-4550
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Beamline phone number
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(510) 495-2113
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| Website |
http://AIT.lbl.gov  |
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