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Beamline 7.3.1 Print

 

Photoemission electron microscope PEEM2

 

Scientific disciplines: Magnetism, materials, surface science, polymers

 

Note: This beamline is NOT open to general users.

 

GENERAL BEAMLINE INFORMATION

Operational

Yes, but not open to users

Source characteristics

Bend magnet

Energy range

180-1500 eV

Monochromator

SGM

Calculated flux (1.9 GeV, 400 mA)

3 x 1012 photons/s/0.1%BW at 800 eV (linearly polarized)

Resolving power (E/ΔE)

1,000

Endstations

Photoemission electron microscope (PEEM2)

Characteristics

X-ray absorption spectromicroscopy

Spatial resolution

Below 100 nm

Detectors

Slow scan CCD

Spot size at sample

30 x 30 µm

Sample format

UHV-compatible flat, conductive samples up to 1 cm2 in area

Sample preparation

Sputter-cleaning, heating, e-beam and sputter evaporation, LEED, transfer capability, magnet (1 kOe)

Sample environment

UHV, sample heating (800 K)

Special notes

Choice of linearly or circularly polarized radiation (flux of circularly polarized radiation is reduced)

Scientific disciplines Magnetism, materials, surface science, polymers.

Scientific applications

Real-time and pump-probe study of elemental, chemical, magnetic, and topographical properties of materials

Local contact

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Advanced Light Source, Berkeley Lab
Phone: (510) 486-4867
Fax: (510) 486-7696

Spokesperson

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Stanford Synchrotron Radiation Laboratory
Phone: (650) 926-2570
Fax: (650) 926-4100

Beamline phone number

(510) 495-2073

Website http://xraysweb.lbl.gov/peem2/webpage/Home.shtml