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Beamline 7.0.1 Print

 

Surface and Materials Science, Spectromicroscopy

 

Scientific disciplines: Correlated electron system, materials science

 

Endstations:

 

GENERAL BEAMLINE INFORMATION

Operational

Yes

Proposal cycle Proposals for General Sciences Beamlines (6-month cycle)

Source characteristics

5-cm period undulator (U5) (first, third, and fifth harmonics)

Energy range

See endstation tables

Monochromator

See endstation tables

Scientific disciplines Correlated electron system, materials science
Website Beamline 7: http://www-bl7.lbl.gov/

 

ENDSTATION INFORMATION

Endstation name

nanoARPES

Operational This instrument is currently under development. Expected user operation in 2012. For consideration, speak to the beamline scientist before applying for beamtime.

Characteristics

Designed for submicron XPS

Energy range

100-800 eV

Monochromator

SGM (gratings: 150, 380, 925 lines/mm)

Calculated flux (1.9 GeV, 400 mA)

~108-109 photons/s/0.01% BW

Resolving power (E/ΔE)

3000

Spatial resolution

Scanning microscope with focusing by means of Fresnel zone plates; resolution determined by spot size, which is 150 nm with current zone plates but will improve with new zone plates

Detectors

Hemispherical electron energy analyzer; total electron yield detector

Spot size at sample

300-500 nm with current zone plates

Sample format

UHV-compatible solids up to 25 mm in diameter. Must be conducting.

Sample preparation

Preparation chamber with sputtering and annealing provided

Sample environment

UHV

Special notes

Optical alignment equipment provided so that visible marks on the sample surface can be used to find an area of interest prior to x-ray measurements; in-situ heating and cooling

Experimental techniques

XPS, NEXAFS, imaging of areas up to 100 µm across

Local contact / Spokesperson

This e-mail address is being protected from spambots. You need JavaScript enabled to view it
Advanced Light Source, Berkeley Lab
Phone: (510) 486-5975
Fax: (510) 486-7696

Beamline phone number (510) 495-2070

 

ENDSTATION INFORMATION

Endstation name

Electronic Structure Factory (ESF)

Operational Yes

Characteristics

High-resolution, angle-resolved XPS spectroscopy; capable of making images by rastering the sample through a fixed spot; sample is rotated for angle-resolved measurements

Energy range

78-1200 eV

Monochromator

SGM (gratings: 150, 380, 925 lines/mm)

Calculated flux (1.9 GeV, 400 mA)

~1012 photons/s/0.01% BW (resolution dependent)

Resolving power (E/ΔE)

less than or equal to 8000

Detectors

Scienta R4000

Spot size at sample

50 µm x 50 µm

Angular resolution 0.1 degree

Sample format

UHV-compatible solids up to 25 mm in diameter

Sample preparation

Preparation chamber with Leed, sputtering, heating, magnetization coil, transition and other metal sources, ESCA with Mg and Al anode source

Sample environment

UHV, 10-11 torr, <12K - 400K

Special notes

LEED and in-situ sample heating and cooling available

Scientific applications

Band structure determination and photoelectron diffraciton; condensed matter science, surface science, correlated materials, magentic systems

Experimental techniques

XPS, XPD, NEXAFS

Web site http://www-bl7.lbl.gov/BL7/endstations/esf.html

Local contact / Spokesperson

This e-mail address is being protected from spambots. You need JavaScript enabled to view it
Advanced Light Source, Berkeley Lab
Phone: (510) 486-5975
Fax: (510) 486-7696

Beamline phone number (510) 495-2071

 

ENDSTATION INFORMATION

Endstation name

Advanced x-ray inelastic scattering (AXIS)

Operational Yes

Characteristics

Grating spectrometer for high-resolution (1:2000) photon-in/photon-out spectroscopy

Energy range

78-1200 eV

Monochromator

SGM (gratings: 150, 380, 925 lines/mm)

Calculated flux (1.9 GeV, 400 mA)

3 x 1012 photons/s/0.01% BW (resolution dependent)

Resolving power (E/ΔE)

<5000

Detectors

Micro-channel-plate photon counter in spectrometer focal plane; channeltron fluorescence detector

Spot size at sample

50 µm x 50 µm

Sample format

UHV-compatible solids up to 25 mm in diameter or gases and liquids in windowed cells

Sample preparation

No preparation chamber provided

Sample environment

UHV

Special notes

This spectrometer is installed by the group from the University of Uppsala, Sweden.

Experimental techniques

XES, RIXS, NEXAFS

Local contact / Spokesperson

This e-mail address is being protected from spambots. You need JavaScript enabled to view it
Advanced Light Source, Berkeley Lab
Phone: (510) 495-2230
Fax: (510) 495-2067

Beamline phone number (510) 495-2079

 

More information about this beamline is available at the Beamline 7.0 Web site .