LBNL Masthead A-Z IndexBerkeley Lab mastheadU.S. Department of Energy logoPhone BookJobsSearch
Beamline 12.0.1 Print

 

EUV optics testing and interferometry, angle- and spin-resolved photoemission

 

Scientific discipline: Applied science, correlated electron systems

 

Endstations:

 

GENERAL BEAMLINE INFORMATION

Operational

Yes

Proposal cycle Proposals for General Sciences Beamlines (6-month cycle)

Source characteristics

8-cm-period undulator (U8)

Energy range

See endstation tables

Monochromator

See endstation tables

Endstations

Angle- and spin-resolved photoemission (12.0.1.1)
SEMATECH Berkeley Microfield Exposure Tool (MET) (12.0.1.2)

Berkeley Dose Calibration Tool (DCT)(12.0.1.3)

Beamline phone numbers

(510) 495-2121 (12.0.1.1)
(510) 495-2120 (12.0.1.2/12.0.1.3)

Websites

http://www.cxro.lbl.gov

http://ssg.als.lbl.gov/ssgbeamlines/beamline12-0-1

 

ENDSTATION INFORMATION

Endstation name

Angle- and spin-resolved photoemission (12.0.1.1)

Operational

Yes

Energy range

25–300 eV

Monochromator

VLS-PGM (200-, 300-, 600-, and 1200-line/mm gratings)

Calculated flux (1.9 GeV, 400 mA)

1014 photons/s/1%BW at 100 eV

Resolving power (E/ΔE)

Grating-dependent, typically from 5,000 to 10,000

Spatial resolution 10 microns
Spot size at sample 80 x 100 microns

Detectors

Scienta SES-100 (angle-resolved photoemission), R3000, R4000

Sample format

UHV-compatible solids

Sample preparation

Sample manipulator with five degrees of freedom; temperature control from 10 to 375 K

Evaporation, ion sputtering, high-temperature annealing, UHV cleave

Sample environment

UHV

Scientific applications

Band structure measurements

Scientific disciplines Applied science, correlated electron system

Local contact

This e-mail address is being protected from spambots. You need JavaScript enabled to view it
Advanced Light Source, Berkeley Lab
Phone: (510) 486-7521
Fax: (510) 495-2067

Spokesperson

This e-mail address is being protected from spambots. You need JavaScript enabled to view it
Univ. of Colorado at Boulder
Phone: (303) 492-1607
Fax: (303) 492-2998

Website

http://ssg.als.lbl.gov/ssgbeamlines/beamline12-0-1

 

ENDSTATION INFORMATION

Endstation name

Berkeley Dose Calibration Tool (DCT) (12.0.1.2)

Operational

Now, not open to users

Energy range

25-300 eV

Monochromator

VLS-PGM

Calculated flux (1.9 GeV, 400 mA)

~5 x 1013 photons/s/1%BW at 134 eV

Resolving power (E/ΔE)

200-10,000

Spatial resolution 15 nm

Detectors

GaAsP flux monitor, silicon 1024 x 1024 CCD array

Characteristics 0.3-NA EUV lithography tool
Sample format Resist-coated silicon wafers, and 6" EUV masks

Sample preparation

Cleanroom handling

Sample environment

10-8 Torr

Sample handling automation Load-lock transfer

Scientific applications

Absolute dose calibration of EUV photoresists

Scientific disciplines Applied science

Local contact / Spokesperson

This e-mail address is being protected from spambots. You need JavaScript enabled to view it
Center for X-Ray Optics, Berkeley Lab
Phone: (510) 486-5288
Fax: (510) 486-4550

 

This e-mail address is being protected from spambots. You need JavaScript enabled to view it
Center for X-Ray Optics, Berkeley Lab
Phone: (510) 486-4529
Fax: (510) 486-4550

Website http://www.cxro.lbl.gov

 

ENDSTATION INFORMATION

Endstation name

SEMATECH Berkeley Microfield Exposure Tool (MET) (12.0.1.3)

Operational

Yes, but not open to users

Energy range

25-300 eV

Monochromator

VLS-PGM

Calculated flux (1.9 GeV, 400 mA)

~5 x 1013 photons/s/1%BW at 134 eV

Resolving power (E/ΔE)

200-10,000

Spatial resolution 1 mm

Detectors

GaAsP flux monitor, silicon 1024 x 1024 CCD array

Characteristics Absolute sensitivity calibration
Sample format Resist-coated silicon wafers

Sample preparation

Cleanroom handling

Sample environment

10-7 Torr

Scientific applications

EUV lithography and EUV photoresist screening

Scientific disciplines Applied science

Local contact / Spokesperson

This e-mail address is being protected from spambots. You need JavaScript enabled to view it
Center for X-Ray Optics, Berkeley Lab
Phone: (510) 486-5288
Fax: (510) 486-4550

 

This e-mail address is being protected from spambots. You need JavaScript enabled to view it
Center for X-Ray Optics, Berkeley Lab
Phone: (510) 486-4529
Fax: (510) 486-4550

Website http://www.cxro.lbl.gov